中科院等团队研究 Pt-W 合金作为低 n 值 EUV 掩模吸收层，有望支持更薄的高 NA EUV 掩模
Pt-W Alloy Shows Potential For Thinner High-NA EUV Mask Absorbers (Chinese Academy of Sciences et al.)
中科院、吉林大学等机构的研究团队发表论文，评估 Pt-W 合金作为下一代低 n 值 EUV 掩模吸收层的薄膜特性与成像性能。该成果发表于 2026 年 8 月的 iScience，显示 Pt-W 合金有望用于更薄的高 NA EUV 掩模吸收层。
Researchers at Chinese Academy of Sciences, Jilin University, State Key Laboratory of Advanced Manufacturing for Optical Systems, and University of Chinese Academy of Sciences published a technical paper titled “Evaluating an alternative Pt-W alloy as a low-n EUV mask absorber: Film properties and imaging performance.”
“In this study, we investigate an alternative Pt-W alloy as a next-generation low-n EUV mask absorber,” states the paper.
Find the technical paper here. August 2026.
Li, Zhonghua, Haolong Tang, Xiaoyi Wang, Hongwei Tian, Yanchao Wang, and Hanwen Hu. “Evaluating an alternative Pt-W alloy as a low-n EUV mask absorber: Film properties and imaging performance.” iScience, August 2026. https://doi.org/10.1016/j.isci.2026.116912. Attribution-NonCommercial 4.0 International.
来源： Semiconductor Engineering 芯片与封装 · semiengineering.com