KU Leuven 等研究发现干法沉积光刻胶在 EUV 与电子束曝光下呈现不同的极性转换行为

Dry-Deposited Resist Shows Different Tone Behavior Under EUV And E-Beam Exposure (KU Leuven, Kunsan, VUB, Imec)

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KU Leuven、群山国立大学、布鲁塞尔自由大学和 imec 等机构的研究人员在 ACS Applied Materials & Interfaces 发表论文，报道了一种完全通过干法沉积的卤化非晶沸石咪唑酯骨架（a-ZIF）金属有机光刻胶，可用于下一代半导体制造中的先进图案化工艺。该光刻胶在电子束与 EUV 两种曝光源下表现出显著的、随辐照源变化的极性（tone）转换行为。

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Researchers at KU Leuven, Kunsan National University, Vrije Universiteit Brussel, imec, et al. published “Irradiation-Source-Dependent Tone Conversion in Dry-Deposited Halogenated Amorphous Zeolitic Imidazolate Framework Resists for Electron-Beam and Extreme Ultraviolet Lithography.”

Abstract Excerpt:
“Dry-deposited metal–organic resists are key enablers for advanced patterning processes in next-generation semiconductor manufacturing. Here, we report halogenated amorphous zeolitic imidazolate framework (a-ZIF) resists deposited entirely by a dry process, which exhibit a pronounced irradiation-source-dependent tone conversion.”

Find the technical paper here. October 2026.

Byeon, Jinhwan, Nick Gys, Jorid Smets, Ali Azimi, Lukas Nulens, João Fernandes, Leen Boullart et al. “Irradiation-Source-Dependent Tone Conversion in Dry-Deposited Halogenated Amorphous Zeolitic Imidazolate Framework Resists for Electron-Beam and Extreme Ultraviolet Lithography.” ACS Applied Materials & Interfaces (2026).