Pt-W Alloy Shows Potential For Thinner High-NA EUV Mask Absorbers (Chinese Academy of Sciences et al.)
Pt-W Alloy Shows Potential For Thinner High-NA EUV Mask Absorbers (Chinese Academy of Sciences et al.)
A research team from the Chinese Academy of Sciences, Jilin University and other institutions has published a paper evaluating the thin-film properties and imaging performance of Pt-W alloy as a next-generation low-n EUV mask absorber. The findings, published in iScience in August 2026, indicate that Pt-W alloy is promising for thinner high-NA EUV mask absorbers.
Researchers at Chinese Academy of Sciences, Jilin University, State Key Laboratory of Advanced Manufacturing for Optical Systems, and University of Chinese Academy of Sciences published a technical paper titled “Evaluating an alternative Pt-W alloy as a low-n EUV mask absorber: Film properties and imaging performance.”
“In this study, we investigate an alternative Pt-W alloy as a next-generation low-n EUV mask absorber,” states the paper.
Find the technical paper here. August 2026.
Li, Zhonghua, Haolong Tang, Xiaoyi Wang, Hongwei Tian, Yanchao Wang, and Hanwen Hu. “Evaluating an alternative Pt-W alloy as a low-n EUV mask absorber: Film properties and imaging performance.” iScience, August 2026. https://doi.org/10.1016/j.isci.2026.116912. Attribution-NonCommercial 4.0 International.
Source: Semiconductor Engineering Chips and Packaging · semiengineering.com