CAS and Others Study Pt-W Alloy as a Thinner High-NA EUV Mask Absorber
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A research team from the Chinese Academy of Sciences, Jilin University and other institutions published a paper evaluating the thin-film properties and imaging performance of Pt-W alloy as a next-generation low-n EUV mask absorber. The findings were published in iScience in August 2026. The study shows that Pt-W alloy is a promising candidate for thinner High-NA EUV mask absorber layers, offering a candidate material for next-generation EUV lithography masks. The work remains at the academic research stage, with no reports of volume production applications.
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- Semiconductor Engineering Chips and PackagingPt-W Alloy Shows Potential For Thinner High-NA EUV Mask Absorbers (Chinese Academy of Sciences et al.)
A research team from the Chinese Academy of Sciences, Jilin University and other institutions has published a paper evaluating the thin-film properties and imaging performance of Pt-W alloy as a next-generation low-n EUV mask absorber. The findings, published in iScience in August 2026, indicate that Pt-W alloy is promising for thinner high-NA EUV mask absorbers.
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