Hyper-NA EUV: The Next Extension Beyond High NA Lithography (Carl Zeiss, ASML)
Hyper-NA EUV: The Next Extension Beyond High NA Lithography (Carl Zeiss, ASML)
Researchers at Carl Zeiss SMT and ASML published a paper proposing a Hyper-NA EUV lithography scheme with a numerical aperture of at least 0.75, as a path beyond today's 0.55 NA High-NA systems.
Researchers at Carl Zeiss SMT and ASML published a technical paper titled “Hyper-NA: a system with a numerical aperture of at least 0.75.”
Abstract Summary:
The researchers examine Hyper-NA EUV lithography with a numerical aperture of at least 0.75 as a path beyond current 0.55-NA High-NA systems, including the optical architecture, resolution potential, reticle 3D effects, polarization, and requirements for extending the existing EUV ecosystem.
Find the technical paper here. October 2026.
Patra, Michael, Heiko Feldmann, Jens Timo Neumann, and Gerardo Bottiglieri. “Hyper-NA: a system with a numerical aperture of at least 0.75.” Journal of Micro/Nanopatterning, Materials, and Metrology 25, no. 4 (2026): 041807. https://doi.org/10.1117/1.JMM.25.4.041807
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