Chip Industry Technical Paper Roundup: Oct. 13
Semiconductor Engineering collects multiple recent chip technology papers, covering spatially deterministic nucleation of 2D semiconductors from KAIST and other institutions, the Hyper-NA EUV lithography system with a numerical aperture of at least 0.75 from Zeiss SMT and ASML, and BARE-AI from the University of Florida and others, which uses built-in performance monitors to defend against bit-flip attacks in AI hardware.