Industry advances 12-inch large mask roadmap
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On industry progress toward 12-inch (roughly 6x12-inch) large mask blanks, the latest 15th annual eBeam Initiative Luminaries survey shows that 66% of the experts surveyed predict the industry will adopt this large mask format within the next decade. In earlier discussions, large masks were still an industry vision; they have now entered a concrete roadmap stage: TSMC and ASML have announced they aim to build a 12-inch mask pilot line by 2031. Experts believe that adopting large masks can bring about a 40% productivity improvement. In addition, the survey shows 68% of respondents expect purchases of lithography mask etching systems to increase over the next three years, mainly to meet compatibility requirements for new High-NA mask materials. Current status: large masks have formally moved from the vision stage to an industry roadmap, with leading vendors having given clear timelines.
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- Semiconductor Engineering Chips and PackagingLarge-Format Masks Move From Aspiration To Industry Roadmap
The eBeam Initiative's 15th annual Luminaries survey shows 66% of surveyed experts predict the industry will adopt large-format masks of roughly 6 x 12 inches within the next decade. TSMC and ASML have announced plans to build a pilot line for 12-inch masks by 2031, and experts believe they could deliver about a 40% productivity gain. 68% of respondents expect purchases of lithography mask etch systems to increase over the next three years, mainly driven by compatibility needs for new High-NA mask materials.
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